Corning supplies raw materials offering material durability, high transmission, and low coefficient of thermal expansion, which make them the ideal materials to transmit light from a lithography machine’s light source to the semiconductor wafer. This enables precision down to nanometer-sized features.
Each of our materials have unique attributes that help manage light for photolithography processes. Corning’s CaF2 has unmatched durability to withstand the high energy levels of deep UV lasers. Corning’s HPFS® is an ultra-pure material that is perfect for making illumination and imaging optics with the most stringent imaging performance, and Corning’s ULE® glass is an ultra-stable material that can retain its shape and imaging performance in the challenging thermal environment of an EUV stepper.
